Mask of amorphous hydrogenated carbon films applied to chemical polishing and chemical dicing of silicon wafers

Author： Fissore A.   Alves M.A.R.   da Silva Braga E.   Cescato L.  

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.55, Iss.1, 1999-10, pp. : 23-25

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