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Modeling etch rate and uniformity of oxide via etching in a CHF 3 /CF 4 plasma using neural networks

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Reactive ion etching of vapor phase deposited polyimide films in CF 4 /O 2 : Effect on surface morphology

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Selective deposition of amorphous hydrogenated carbon films used as masks for reactive ion etching of Si using CF 4

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The altered layer formation during the reactive ion etching of GaAs in CF 2 Cl 2 +O 2 plasma

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