Author: Naka M. Shibayanagi T. Maeda M. Zhao S. Mori H.
Publisher: Elsevier
ISSN: 0042-207X
Source: Vacuum, Vol.59, Iss.1, 2000-10, pp. : 252-259
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
The physical properties of Al-doped zinc oxide films prepared by RF magnetron sputtering
Thin Solid Films, Vol. 305, Iss. 1, 1997-08 ,pp. :
Physical parameters affecting deposition rates of binary alloys in a magnetron sputtering system
By Habib S.K. Rizk A. Mousa I.A.
Vacuum, Vol. 49, Iss. 2, 1998-02 ,pp. :
Microstructure and Properties of AlSn20 Coating Deposited via Magnetron Sputtering
Materials Science Forum, Vol. 2015, Iss. 816, 2015-05 ,pp. :