Influence of H 2 O partial pressure in the sputtering chamber on the crystallinity and relative dielectric constant of SrTiO 3 thin film prepared at low substrate temperature

Author: Nakagawara O.   Fujibayashi K.   Makino T.   Katayama Y.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.59, Iss.2, 2000-11, pp. : 742-747

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