Discharge cleaning of aluminum components

By Mozetic M.   Zalar A.  

Vacuum, Vol. 71, Iss. 1, 2003-05 ,pp. : 233-236

Elsevier

Access to resources Recommend Favorite

Room temperature wafer surface cleaning by in-situ ECR (electron cyclotron resonance) hydrogen plasma for silicon homoepitaxial growth

By Kim H.-w.   Zhou Z.-H.   Reif R.  

Thin Solid Films, Vol. 302, Iss. 1, 1997-06 ,pp. : 169-178

Elsevier

Access to resources Recommend Favorite

In-situ low-temperature (600 o C) wafer surface cleaning by electron cyclotron resonance hydrogen plasma for silicon homoepitaxial growth

By Kim H.-W.   Reif R.  

Thin Solid Films, Vol. 289, Iss. 1, 1996-11 ,pp. : 192-198

Elsevier

Access to resources Recommend Favorite

Chamber wall cleaning in a reactive ECR plasma

By Horiuchi K.   Nishina A.   Iizuka S.   Sato N.  

Thin Solid Films, Vol. 316, Iss. 1, 1998-03 ,pp. : 148-151

Elsevier

Access to resources Recommend Favorite

Microwave plasma cleaning of ion implant ceramic insulators

By Law V.J.   Tait D.  

Vacuum, Vol. 49, Iss. 4, 1998-04 ,pp. : 273-278

Elsevier

Access to resources Recommend Favorite