Iron silicide formed in a-Si:Fe thin films by magnetron co-sputtering and ion implantation

Author: Nikolaeva M.   Sendova-Vassileva M.   Dimova-Malinovska D.   Karpuzov D.   Pivin J.C.   Beshkov G.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.69, Iss.1, 2002-12, pp. : 221-225

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Abstract