Crystallization and decrease in resistivity on heat treatment of amorphous indium tin oxide thin films prepared by d.c. magnetron sputtering

By Morikawa H.   Fujita M.  

Thin Solid Films, Vol. 339, Iss. 1, 1999-02 ,pp. : 309-313

Elsevier

Access to resources Recommend Favorite

Properties of amorphous SiO 2 films prepared by reactive RF magnetron sputtering method

By He L.-N.   Xu J.  

Vacuum, Vol. 68, Iss. 2, 2002-10 ,pp. : 197-202

Elsevier

Access to resources Recommend Favorite

Phase transformation of (Ni 66 Fe 22 Co 12 ) x C 1-x nanocomposite films prepared by d.c. magnetron co-sputtering

By Wang H.   Wong S.P.   Lau W.F.   Yan X.   Lu X.   Cheung W.Y.   Ke N.  

Thin Solid Films, Vol. 382, Iss. 1, 2001-02 ,pp. : 133-138

Elsevier

Access to resources Recommend Favorite

Low temperature doping of poly-SiGe films with boron by co-sputtering

By Jelenkovic E.V.   Tong K.Y.   Cheung W.Y.   Wilson I.H.   Wong S.P.   Poon M.C.  

Thin Solid Films, Vol. 368, Iss. 1, 2000-06 ,pp. : 55-60

Elsevier

Access to resources Recommend Favorite

Properties of indium tin oxide films with indium tin modulation layers prepared by nano-scale controlled reactive magnetron sputtering

By Takashima Y.   Sasaki K.   Hata T.   Zahirul Alam A.H.M.  

Thin Solid Films, Vol. 279, Iss. 1, 1996-06 ,pp. : 131-134

Elsevier

Access to resources Recommend Favorite