Influence of annealing on ZnO thin film grown by plasma-assisted MOCVD

Author: Du G.   Wang J.   Wang X.   Jiang X.   Yang S.   Ma Y.   Yan W.   Gao D.   Liu X.   Cao H.   Xu J.   Chang R.P.H.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.69, Iss.4, 2003-01, pp. : 473-476

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Abstract