Quantitative depth profiling of Al 3 Hf phase formed by Hf ions implantation into aluminum

Author: Miao W.   Tao K.   Liu X.   Li B.   Liu B.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.69, Iss.4, 2003-01, pp. : 467-472

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Abstract