Reactive ion etching of novel materials-GaN and SiC

Author: Szczesny A.   Sniecikowski P.   Szmidt J.   Werbowy A.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.70, Iss.2, 2003-03, pp. : 249-254

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract