Author: Szczesny A. Sniecikowski P. Szmidt J. Werbowy A.
Publisher: Elsevier
ISSN: 0042-207X
Source: Vacuum, Vol.70, Iss.2, 2003-03, pp. : 249-254
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
A SiCl 4 reactive ion etching and laser reflectometry process for AlGaAs/GaAs HBT fabrication
By Granier H. Tasselli J. Marty A. Hu H.P.
Vacuum, Vol. 47, Iss. 11, 1996-11 ,pp. :
Planarization of Epitaxial SiC Trench Structures by Plasma Ion Etching
Materials Science Forum, Vol. 2015, Iss. 821, 2015-07 ,pp. :