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Thin Solid Films, Vol. 311, Iss. 1, 1997-12 ,pp. : 230-238

Elsevier

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Semiconducting and structural properties of CrSi 2 A-type epitaxial films on Si(111)

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Thin Solid Films, Vol. 280, Iss. 1, 1996-07 ,pp. : 211-220

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Pattern evolution during the growth of CrSi 2 layers on Si (111) upon high current pulsed Cr ion implantation

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Thin Solid Films, Vol. 384, Iss. 1, 2001-03 ,pp. : 53-57

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Erratum to ''Formation of CrSi 2 studied by Rutherford Backscattering Spectrometry'' [Vacuum 45(4) 421-422]

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Vacuum, Vol. 60, Iss. 3, 2001-03 ,pp. : 369-369

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Formation and properties of Cr-Si sputtered alloys

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Vacuum, Vol. 65, Iss. 3, 2002-05 ,pp. : 503-507

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