Improvement of the electrochemical behaviour of AlN films produced by reactive sputtering using various under-layers

Author： Vacandio F. Massiani Y. Gravier P. Rossi S. Bonora P.L. Fedrizzi L.

Publisher： Elsevier

ISSN： 0013-4686

Source： Electrochimica Acta, Vol.46, Iss.24, 2001-08, pp. : 3827-3834

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