Effects of O 2 annealing after etching SrBi 2 Ta 2 O 9 thin film in Cl 2 /CF 4 /Ar plasma

Author: Kim D.-P.   Kim C.-I.   Yu B.-G.  

Publisher: Elsevier

ISSN: 0167-9317

Source: Microelectronic Engineering, Vol.66, Iss.1, 2003-04, pp. : 904-911

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Abstract