Characteristics of sputter-deposited Ru thin films on Si substrates

Author: Lee H.-Y.   Hsieh Y.-W.   Hsu C.-H.   Liang K.S.  

Publisher: Elsevier

ISSN: 0254-0584

Source: Materials Chemistry and Physics, Vol.82, Iss.3, 2003-12, pp. : 984-990

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Abstract