Integration of a stack of two fluorine doped silicon oxide film with ULSI interconnect metallization

Author： Cheng Y.L. Wang Y.L. Liu C.P. Wu Y.L. Lo K.Y. Liu C.W. Lan J.K. Ay C. Feng M.S.

Publisher： Elsevier

ISSN： 0254-0584

Source： Materials Chemistry and Physics, Vol.83, Iss.1, 2004-01, pp. : 150-157

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