Current Conduction and Dielectric Behavior of High k-Y 2 O 3 Films Integrated with Si Using Chemical Vapor Deposition as a Gate Dielectric for Metal-Oxide-Semiconductor Devices

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Electrical properties of Ga 2 O 3 -based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)

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Ferroelectricity in \hbox{PbTiO}_{3} Thin Films: A First Principles Approach

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Fabrication of three-dimensional electromagnetic band-gap structure with high-K dielectric ceramics by rapid-prototyping

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Anodizing Properties of High Dielectric Oxide Films Coated on Aluminum by Sol-Gel Method

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