Characterization of Crystalline Carbon Nitride Films Deposited on Si and Si 3 N 4 /Si Substrate by RF Magnetron Sputtering System with DC Bias

Author: Lee J.  

Publisher: Springer Publishing Company

ISSN: 1385-3449

Source: Journal of Electroceramics, Vol.13, Iss.1-3, 2004-07, pp. : 321-326

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