Effect of vanadium doping on ferroelectric and electrical properties of Bi 3.25 La 0.75 Ti 3 O 12 thin film

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Journal of Electroceramics, Vol. 16, Iss. 3, 2006-05 ,pp. : 207-211

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Oriented growth of Bi 3.25 La 0.75 Ti 3 O 12 thin films on RuO 2 /SiO 2 /Si substrates by using the polymeric precursor method: Structural, microstructural and electrical properties

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Synthesis and properties of ferroelectric Si-doped (Bi, Nd) 4 Ti 3 O 12 thin films by chemical solution deposition

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Preparation and Properties of Bi 4 − x Nd x Ti 3 O 12 Thin Films by Chemical Solution Deposition

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Influence of vanadium substitution on the conductivity of Bi 3.25 La 0.75 Ti 3 O 12 and Bi 3.25 La 0.75 Ti 2.97 V 0.03 O 12 ceramics

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