Electrical properties of ultrathin HfO 2 gate dielectrics on partially strain compensated SiGeC/Si heterostructures

Author: Mahapatra R.   Maikap S.   Ray S.  

Publisher: Springer Publishing Company

ISSN: 1385-3449

Source: Journal of Electroceramics, Vol.16, Iss.4, 2006-07, pp. : 545-548

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