Effects of the O 2 /Ar gas flow ratio on the electrical and transmittance properties of ZnO:Al films deposited by RF magnetron sputtering

Author: Yim Keunbin   Kim Hyounwoo   Lee Chongmu  

Publisher: Springer Publishing Company

ISSN: 1385-3449

Source: Journal of Electroceramics, Vol.17, Iss.2-4, 2006-12, pp. : 875-877

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