Effect of Oxygen Plasma on Growth, Structure and Ferroelectric Properties of \hbox{SrBi}_{2}\hbox{Ta}_{2}\hbox{O}_{9} Thin Films Formed by Pulsed Laser Ablation Technique

Author: Tirumala S.   Rastogi A.C.   Desu S.B.  

Publisher: Springer Publishing Company

ISSN: 1385-3449

Source: Journal of Electroceramics, Vol.5, Iss.1, 2000-08, pp. : 7-20

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract