The optimization of the double mask system to minimize the contact resistance of a Ti/Pt/Au contact

Author： Waytena G.   Hoff H.   Isaacson I.   Rebbert M.   Ma D.   Marrian Christie   Suehle J.  

Publisher： Springer Publishing Company

ISSN： 1543-186X

Source： Journal of Electronic Materials, Vol.26, Iss.2, 1997-02, pp. : 90-96

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