Analysis of reactor geometry and diluent gas flow effects on the metalorganic vapor phase epitaxy of AIN and GaN thin films on α(6H)-SiC substrates

Author: Hanser A.   Wolden C.   Perry W.   Zheleva T.   Carlson E.   Banks A.   Therrien R.   Davis R.  

Publisher: Springer Publishing Company

ISSN: 1543-186X

Source: Journal of Electronic Materials, Vol.27, Iss.4, 1998-04, pp. : 238-245

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