H 2 -based dry plasma etching for mesa structuring of HgCdTe

Author： Smith E.   Musca C.   Redfern D.   Dell J.   Faraone L.  

Publisher： Springer Publishing Company

ISSN： 1543-186X

Source： Journal of Electronic Materials, Vol.29, Iss.6, 2000-06, pp. : 853-858

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