Deposition characteristics of Ti−Si−N films reactively sputtered from various targets in a N 2 /Ar gas mixture

Author： Lee W.   Park S.   Kang B.   Reucroft P.   Lee J.  

Publisher： Springer Publishing Company

ISSN： 1543-186X

Source： Journal of Electronic Materials, Vol.30, Iss.2, 2001-02, pp. : 84-88

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