Influence of the Silicon Substrate on Defect Formation in MCT Grown on II-VI Buffered Si Using a Combined Molecular Beam Epitaxy/Metal Organic Vapor Phase Epitaxy Technique

Author: Hails Janet   Keir Andrew   Graham Andrew   Williams Gerald   Giess Jean  

Publisher: Springer Publishing Company

ISSN: 1543-186X

Source: Journal of Electronic Materials, Vol.36, Iss.8, 2007-08, pp. : 864-870

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