Formation of TaSi 2 and associated fractal growth on Si surface upon high current pulsed Ta-ion implantation

Author: Cheng X.Q.   Wang R.S.   Tang X.J.   Liu B.X.  

Publisher: Elsevier

ISSN: 0925-8388

Source: Journal of Alloys and Compounds, Vol.363, Iss.1, 2004-01, pp. : 236-241

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract