Spectromicroscopic study of plasma-treatment effect on InP-substrate-based silicon nitride and silicon oxide patterns

ISSN： 0947-8396

Source： Applied Physics A, Vol.78, Iss.4, 2004-03, pp. : 623-626

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Silicon nitride/silicon oxide interlayers for solar cell passivating contacts based on PECVD amorphous silicon

PHYSICA STATUS SOLIDI - RAPID RESEARCH LETTERS (ELECTRONIC), Vol. 9, Iss. 11, 2015-11 ,pp. : 617-621

John Wiley & Sons Inc

Access to resources Recommend Favorite

Valence band offset at silicon/silicon nitride and silicon nitride/silicon oxide interfaces

By Gritsenko V.A. Shaposhnikov A.V. Kwok W.M. Wong H. Jidomirov G.M.

Thin Solid Films, Vol. 437, Iss. 1, 2003-08 ,pp. : 135-139

Elsevier

Access to resources Recommend Favorite

Effect of slip amplitude on the fretting wear of silicon nitride against silicon nitride

By Vizintin J. Kalin M. Novak S. Drazic G. Ives L.K. Peterson M.B.

Wear, Vol. 192, Iss. 1, 1996-03 ,pp. : 11-20

Elsevier

Access to resources Recommend Favorite

Preparation of hard and ultra water-repellent silicon oxide films by microwave plasma-enhanced CVD at low substrate temperatures

By Wu Y. Sugimura H. Inoue Y. Takai O.

Thin Solid Films, Vol. 435, Iss. 1, 2003-07 ,pp. : 161-164

Elsevier

Access to resources Recommend Favorite

Field emission graphene–oxide–silicon field effect based photodetector

PHYSICA STATUS SOLIDI - RAPID RESEARCH LETTERS (ELECTRONIC), Vol. 9, Iss. 11, 2015-11 ,pp. : 656-662

John Wiley & Sons Inc

Access to resources Recommend Favorite