Process characterization and statistical analysis of oxide CMP on a silicon wafer with sparse data

Author： Bukkapatnam S.T.S.   Rao P.K.   Lih W.-C.   Chandrasekaran N.   Komanduri R.  

Publisher： Springer Publishing Company

ISSN： 0947-8396

Source： Applied Physics A, Vol.88, Iss.4, 2007-09, pp. : 785-792

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