Plasma Sources Science and Technology,volume 20,issue 1  (02-2016)

Period of time： 2016年1期

Publisher： IOP Publishing

Founded in： 1992

Total resources： 30

ISSN： 0963-0252

Subject： O4 Physics

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Plasma Sources Science and Technology,volume 20,issue 1

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Anode phenomena in arc discharges: a review

By Shkol'nik Sergey M in (2011)

Plasma Sources Science and Technology,volume 20,issue 1 , Vol. 20, Iss. 1, 2011-02 , pp. 13001-13031

IOP Publishing

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Model of an inductively coupled negative ion source: I. General model description

By Hagelaar G J M,Fubiani G,Boeuf J-P in (2011)

Plasma Sources Science and Technology,volume 20,issue 1 , Vol. 20, Iss. 1, 2011-02 , pp. 15001-15016

IOP Publishing

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Model of an inductively coupled negative ion source: II. Application to an ITER type source

By Boeuf J P,Hagelaar G J M,Sarrailh P,Fubiani G,Kohen N in (2011)

Plasma Sources Science and Technology,volume 20,issue 1 , Vol. 20, Iss. 1, 2011-02 , pp. 15002-15016

IOP Publishing

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Acetylene–argon plasmas measured at a biased substrate electrode for diamond-like carbon deposition: I. Mass spectrometry

By Baby A,Mahony C M O,Maguire P D in (2011)

Plasma Sources Science and Technology,volume 20,issue 1 , Vol. 20, Iss. 1, 2011-02 , pp. 15003-15018

IOP Publishing

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Acetylene–argon plasmas measured at an rf-biased substrate electrode for diamond-like carbon deposition: II. Ion energy distributions

By Baby A,Mahony C M O,Lemoine P,Maguire P D in (2011)

Plasma Sources Science and Technology,volume 20,issue 1 , Vol. 20, Iss. 1, 2011-02 , pp. 15004-15019

IOP Publishing

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Measurements of the total energy lost per electron–ion pair lost in low-pressure inductive argon, helium, oxygen and nitrogen discharge

By Lee Young-Kwang,Ku Ju-Hwan,Chung Chin-Wook in (2011)

Plasma Sources Science and Technology,volume 20,issue 1 , Vol. 20, Iss. 1, 2011-02 , pp. 15005-15014

IOP Publishing

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Ion energy distributions in bipolar pulsed-dc discharges of methane measured at the biased cathode

By Corbella C,Rubio-Roy M,Bertran E,Portal S,Pascual E,Polo M C,Andújar J L in (2011)

Plasma Sources Science and Technology,volume 20,issue 1 , Vol. 20, Iss. 1, 2011-02 , pp. 15006-15013

IOP Publishing

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Ambipolar ion acceleration in an expanding magnetic nozzle

By Longmier Benjamin W,Bering Edgar A,Carter Mark D,Cassady Leonard D,Chancery William J,Díaz Franklin R Chang,Glover Tim W,Hershkowitz Noah,Ilin Andrew V,McCaskill Greg E,Olsen Chris S,Squire Jared P in (2011)

Plasma Sources Science and Technology,volume 20,issue 1 , Vol. 20, Iss. 1, 2011-02 , pp. 15007-15015

IOP Publishing

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Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition

By Tinck S,Bogaerts A in (2011)

Plasma Sources Science and Technology,volume 20,issue 1 , Vol. 20, Iss. 1, 2011-02 , pp. 15008-15017

IOP Publishing

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Circular periodic motion of plasma produced by a small-scale vacuum arc

By Zhuang T,Shashurin A,Keidar M,Beilis I I in (2011)

Plasma Sources Science and Technology,volume 20,issue 1 , Vol. 20, Iss. 1, 2011-02 , pp. 15009-15012

IOP Publishing

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