Plasma Chemistry and Plasma Processing,volume 26,issue 2  (04-2013)

Period of time: 2013年2期

Publisher: Springer Publishing Company

Founded in: 1981

Total resources: 29

ISSN: 0272-4324

Subject: O6 Chemistry

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Plasma Chemistry and Plasma Processing,volume 26,issue 2

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Pulsed-Spray Radiofrequency Plasma Enhanced Chemical Vapor Deposition of CuInS2 Thin Films

By Rodriguez Rene,Pulsipher Daniel,Lau Lisa,Shurdha Endrit,Pak Joshua,Jin Michael,Banger Kublinder,Hepp Aloysius in (2006)

Plasma Chemistry and Plasma Processing,volume 26,issue 2 , Vol. 26, Iss. 2, 2006-04 , pp. 137-148

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