Period of time： 2015年4期
Publisher： Taylor & Francis Ltd
Founded in： 1970
Total resources： 60
ISSN： 1040-8436
Subject： O4 Physics
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Critical Reviews in Solid State and Material Sciences,volume 38,issue 4
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CVD-derived Hf-based High-k Gate Dielectrics
By He Gang,Deng Bin,Sun Zhaoqi,Chen Xiaoshuang,Liu Yanmei,Zhang Lide in (2013)
Critical Reviews in Solid State and Material Sciences,volume 38,issue 4 , Vol. 38, Iss. 4, 2013-01 , pp.
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