CVD-derived Hf-based High-k Gate Dielectrics

Author: He Gang   Deng Bin   Sun Zhaoqi   Chen Xiaoshuang   Liu Yanmei   Zhang Lide  

Publisher: Taylor & Francis Ltd

ISSN: 1040-8436

Source: Critical Reviews in Solid State and Material Sciences, Vol.38, Iss.4, 2013-01, pp. : 235-261

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Abstract