Effects of electrical and temperature stress on polysilicon resistors for CMOS technology applications

Author： Thei K-B.   Chuang H-M.   Tsai S-F.   Lu C-T.   Liao X-D.   Lee K-M.   Liu W-C.  

Publisher： Academic Press

ISSN： 0749-6036

Source： Superlattices and Microstructures, Vol.31, Iss.6, 2002-06, pp. : 289-296

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