Modeling effects of oxygen inhibition in mask-based stereolithography

Author： Jariwala Amit S.   Ding Fei   Boddapati Aparna   Breedveld Victor   Grover Martha A.   Henderson Clifford L.   Rosen David W.  

Publisher： Emerald Group Publishing Ltd

ISSN： 1355-2546

Source： Rapid Prototyping Journal, Vol.17, Iss.3, 2011-04, pp. : 168-175

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