Effects of Lift-off Procedures on Mechanical and Chemical Properties of Photoresists

Author: Imber N   Hershcovitz M   Ashur A   Klein I E  

Publisher: Emerald Group Publishing Ltd

ISSN: 1356-5362

Source: Microelectronics International, Vol.14, Iss.1, 1997-01, pp. : 14-15

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Abstract