Influence of process parameters on the substrate heating in direct current plasma magnetron sputtering deposition process

Author： Krishnasamy Jegenathan Chan Kah-Yoong Tou Teck-Yong

Publisher： Emerald Group Publishing Ltd

ISSN： 1356-5362

Source： Microelectronics International, Vol.27, Iss.2, 2010-05, pp. : 75-78

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