Composition of plasma-chemical silicon dioxide films as studied by IR spectroscopy

Author: Izgorodin V.   Pronina I.   Gogolev V.   Yur’ev V.   Komarevskaya A.  

Publisher: MAIK Nauka/Interperiodica

ISSN: 0018-1439

Source: High Energy Chemistry, Vol.41, Iss.4, 2007-07, pp. : 279-283

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