IPL resistless lithography as a method for delta-doping of monocrystalline semiconductors by Al and Sb implantation

Author： Zhukov V.  

Publisher： MAIK Nauka/Interperiodica

ISSN： 1063-7397

Source： Russian Microelectronics, Vol.34, Iss.2, 2005-03, pp. : 88-94

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