Residual-Photoresist Removal from Si and GaAs Surfaces by Atomic-Hydrogen Flow Treatment

Author： Anishchenko E.   Kagadei V.   Nefedtsev E.   Oskomov K.   Proskurovski D.   Romanenko S.  

Publisher： MAIK Nauka/Interperiodica

ISSN： 1063-7397

Source： Russian Microelectronics, Vol.34, Iss.3, 2005-05, pp. : 131-139

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