Effect of oxygen concentration on diffusion length in Czochralski and magnetic Czochralski silicon

Author: Binetti S.   Acciarri M.   Brianza A.   Savigni C.   Pizzini S.  

Publisher: Maney Publishing

ISSN: 1743-2847

Source: Materials Science and Technology, Vol.11, Iss.7, 1995-07, pp. : 665-669

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