Effects of nitrogen partial pressure on microstructure, morphology and N/Ti ratio of TiN films deposited by reactive magnetron sputtering

Author: Yang K.   Jiang J. Q.   Gu M. Y.  

Publisher: Maney Publishing

ISSN: 1743-2847

Source: Materials Science and Technology, Vol.23, Iss.8, 2007-08, pp. : 958-962

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Abstract