Influence of nitrogen flow rate on growth of TiAlN films prepared by DC magnetron sputtering

Author: Irudayaraj A. A.   Kuppusami P.   Thirumurugesan R.   Mohandas E.   Kalainathan S.   Raghunathan V. S.  

Publisher: Maney Publishing

ISSN: 1743-2944

Source: Surface Engineering, Vol.23, Iss.1, 2007-01, pp. : 7-11

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