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Taylor & Francis Ltd

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Online monitoring of the passivation breakthrough during deep reactive ion etching of silicon using optical plasma emission spectroscopy

By Leopold S   Mueller L   Kremin C   Hoffmann M  

Journal of Micromechanics and Microengineering, Vol. 23, Iss. 7, 2013-07 ,pp. : 74001-74006

IOP Publishing

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Improvement of feature-scale profile evolution in a silicon dioxide plasma etching simulator using the level set method

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Journal of Micromechanics and Microengineering, Vol. 25, Iss. 6, 2015-06 ,pp. : 65013-65023

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New Thermal Ink Jet Printhead with Improved Energy Efficiency Using Silicon Reactive Ion Etching

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Journal of Imaging Science and Technology, Vol. 43, Iss. 4, 1999-07 ,pp. : 332-338

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Comparison of microstructures and thermal insulation capability of plasma sprayed nanostructured and traditional YPSZ coatings

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Materials Science and Technology, Vol. 27, Iss. 1, 2011-01 ,pp. : 35-39

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