On the CVD of MoSi2: an experimental study from the MoCl4–SiCl4–H2–Ar precursor with a view to the preparation of C/MoSi2/SiC and SiC/MoSi2/SiC microcomposites

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Journal of Materials Science, Vol. 33, Iss. 17, 1998-09 ,pp. : 4461-4473

Springer Publishing Company

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Pressure-pulsed chemical vapour infiltration of SiC into two-dimensional-Tyranno/SiC particulate preforms from SiCl4–CH4–H2

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Journal of Materials Science, Vol. 32, Iss. 16, 1997-12 ,pp. : 4289-4294

Springer Publishing Company

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Effects of thickness and deposition rate on the optical absorption properties of co-evaporated Mn/SiOx, Cr/SiOx and Cu/SiOx thin films

By Zaidi S.Z.A.   Beynon J.  

Journal of Materials Science Letters, Vol. 16, Iss. 8, 1997-08 ,pp. : 608-610

Springer Publishing Company

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The effect of diluent gases on the growth behavior of CVD SiC films with temperature

By Lee Y-J.   Choi D-J.   Park J-Y.   Hong G-W.  

Journal of Materials Science, Vol. 35, Iss. 18, 2000-09 ,pp. : 4519-4526

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Study of plasma etching of -SiC thin films grown on Si-substrate

By Chai C.   Yang Y.   Li Y.   Jia H.  

Optical Materials, Vol. 23, Iss. 1, 2003-07 ,pp. : 103-107

Elsevier

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