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Comparison of dry etching of III-V semiconductors in ICl/Ar and IBr/Ar electron cyclotron resonance plasmas

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Radiation Spectrum of an Electron Cyclotron Maser

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Surface cleaning and etching of CdZnTe and CdTe in H 2 /Ar, CH 4 /H 2 /Ar, and CH 4 /H 2 /N 2 /Ar electron cyclotron resonance plasmas

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