Analysis of depth profile for impurity concentration in Si wafer by synchrotron radiation excited total reflection X-ray fluorescence spectroscopy

By Huh B.-K.   Kim J.-S.   Shin N.-S.   Koo Y.-M.   Chung H.-Y.  

Spectrochimica Acta Part B: Atomic Spectroscopy, Vol. 58, Iss. 8, 2003-08 ,pp. : 1445-1452

Elsevier

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Multielement determination in river-water of Sepetiba Bay tributaries (Brazil) by total reflection X-ray fluorescence using synchrotron radiation

By Costa A. C. M.   Castro C. R. F.   Anjos M. J.   Lopes R. T.  

Journal of Radioanalytical and Nuclear Chemistry, Vol. 269, Iss. 3, 2006-09 ,pp. : 703-706

Springer Publishing Company

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Analysis of mineral water from Brazil using total reflection X-ray fluorescence by synchrotron radiation

By Costa A.C.M.   Anjos M.J.   Moreira S.   Lopes R.T.   de Jesus E.F.O.  

Spectrochimica Acta Part B: Atomic Spectroscopy, Vol. 58, Iss. 12, 2003-12 ,pp. : 2199-2204

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Comparison of synchrotron radiation total reflection X-ray fluorescence excitation-detection geometries for samples with differing matrices

By Pepponi G.   Streli C.   Wobrauschek P.   Zamini S.   Zoger N.   Falkenberg G.  

Spectrochimica Acta Part B: Atomic Spectroscopy, Vol. 58, Iss. 12, 2003-12 ,pp. : 2139-2144

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A wavelength-dispersive arrangement for wafer analysis with total reflection X-ray fluorescence spectrometry using synchrotron radiation

By Schwenke H.   Beaven P.A.   Knoth J.   Jantzen E.  

Spectrochimica Acta Part B: Atomic Spectroscopy, Vol. 58, Iss. 12, 2003-12 ,pp. : 2039-2048

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