Author: Efremov A.M. Kim D.P. Kim K.T. Kim C.I.
Publisher: Springer Publishing Company
ISSN: 0272-4324
Source: Plasma Chemistry and Plasma Processing, Vol.24, Iss.1, 2004-03, pp. : 13-28
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
By Sitko Rafał Zawisza Beata Jurczyk Jerzy Bochenek Dariusz Płoñska Małgorzata
Microchimica Acta, Vol. 144, Iss. 1-3, 2004-01 ,pp. :