Period of time: 2013年1期
Publisher: Springer Publishing Company
Founded in: 1981
Total resources: 29
ISSN: 0272-4324
Subject: O6 Chemistry
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Plasma Chemistry and Plasma Processing,volume 24,issue 1
Menu
By Yamamoto Toshiaki,Okubo Masaaki,Imai Norikazu,Mori Yasunao in (2004)
Plasma Chemistry and Plasma Processing,volume 24,issue 1 , Vol. 24, Iss. 1, 2004-03 , pp.Etching Mechanism of Pb(Zr,Ti)O3 Thin Films in Cl2/Ar Plasma
By Efremov A.M.,Kim D.P.,Kim K.T.,Kim C.I. in (2004)
Plasma Chemistry and Plasma Processing,volume 24,issue 1 , Vol. 24, Iss. 1, 2004-03 , pp.By Kim Byungwhan,Kim Sungmo,Hong Wan-Shick in (2004)
Plasma Chemistry and Plasma Processing,volume 24,issue 1 , Vol. 24, Iss. 1, 2004-03 , pp.By Lombaert K.,Morel S.,Le Moyne L.,Adam P.,Tardieu de Maleissye J.,Amouroux J. in (2004)
Plasma Chemistry and Plasma Processing,volume 24,issue 1 , Vol. 24, Iss. 1, 2004-03 , pp.By Song Hyung Keun,Lee Hwaung,Choi Jae-Wook,Na Byung-ki in (2004)
Plasma Chemistry and Plasma Processing,volume 24,issue 1 , Vol. 24, Iss. 1, 2004-03 , pp.Study on Arc Movement in Hollow Electrode Plasma Generators with Impressed Double Magnetic Fields
By Li Mingdong,Deng Weiwei,Fan Yousan,Yang Jiyuan,Liu Xiaolei in (2004)
Plasma Chemistry and Plasma Processing,volume 24,issue 1 , Vol. 24, Iss. 1, 2004-03 , pp.By Ma J.,Yu S.C.M.,Ng H.W.,Lam Y.C. in (2004)
Plasma Chemistry and Plasma Processing,volume 24,issue 1 , Vol. 24, Iss. 1, 2004-03 , pp.By Park M.K.,Ryu S.G.,Park H.B.,Lee H.W.,Hwang K.C.,Lee C.H. in (2004)
Plasma Chemistry and Plasma Processing,volume 24,issue 1 , Vol. 24, Iss. 1, 2004-03 , pp.