Use of Neural Network to Control a Refractive Index of SiN Film Deposited by Plasma Enhanced Chemical Vapor Deposition

Author： Kim Byungwhan   Kim Sungmo   Hong Wan-Shick  

Publisher： Springer Publishing Company

ISSN： 0272-4324

Source： Plasma Chemistry and Plasma Processing, Vol.24, Iss.1, 2004-03, pp. : 29-40

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Structure, Composition, Mechanical, and Tribological Properties of BCN Films Deposited by Plasma Enhanced Chemical Vapor Deposition

By Kurapov D.   Schneider J.  

Plasma Chemistry and Plasma Processing, Vol. 25, Iss. 6, 2005-12 ,pp. : 613-623

Springer Publishing Company

Access to resources Recommend Favorite

Synthesis of Nanostructure Carbon Films Deposited by Microwave Plasma-Enhanced Chemical Vapor Deposition Technique at Room Temperature

By Bisht Atul   Chockalingam Sreekumar   Panwar O. S.   Srivastava A. K.   Kesarwani Ajay Kumar  

Fullerenes, Nanotubes and Carbon Nanostructures, Vol. 23, Iss. 5, 2015-05 ,pp. : 455-462

Taylor & Francis Ltd

Access to resources Recommend Favorite

Chemical Composition of Boron Carbonitride Films Grown by Plasma-Enhanced Chemical Vapor Deposition from Trimethylamineborane

By Kosinova M.L.   Rumyantsev Y.M.   Golubenko A.N.   Fainer N.I.   Ayupov B.M.   Dolgovesova I.P.   Kolesov B.A.   Kaichev V.V.   Kuznetsov F.A.  

Inorganic Materials, Vol. 39, Iss. 4, 2003-04 ,pp. : 366-373

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

Microstructure and Chemical Bonding in Silicon Carbonitride Films Synthesized by Plasma Enhanced Chemical Vapor Deposition

By Smirnova T.P.   Badalyan A.M.   Borisov V.O.   Yakovkina L.V.   Kaichev V.V.   Shmakov A.N.   Nartova A.V.   Rakhlin V.I.   Fomina A.N.  

Journal of Structural Chemistry, Vol. 44, Iss. 1, 2003-01 ,pp. : 169-173

Springer Publishing Company

Access to resources Recommend Favorite